Titanium-dioxide film formation using gas cluster ion beam assisted deposition technique

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 866-869

  Nakatsu, O ^a,b   Matsuo, J ^b   Omoto, K ^b   Seki, T ^b   Takaoka, G ^b   Yamada, I ^c  

^a SHIMADZU CORPORATION   (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c UNIVERSITY OF HYOGO   (Japan)

Author keywords

Assist; Cluster; Deposition; Ion; Titania; Titanium dioxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; ELECTRIC POTENTIAL; EVAPORATION; ION BEAM ASSISTED DEPOSITION; OXIDATION; X RAY DIFFRACTION ANALYSIS;

OXIDE PELLETS;

TITANIUM DIOXIDE;

EID: 0038412779     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00880-2     Document Type: Conference Paper

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