Phase transformation of single crystalline silicon by scratching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 5 A, 2003, Pages 2773-2774

  Jeong, Seong Min ^a   Oh, Han Seog ^a,b   Park, Sung Eun ^a,b   Lee, Hong Lim ^a  

^a Yonsei University   (South Korea)

^b R and D Center   (South Korea)

Author keywords

Atomic force microscopy; Phase transformation; Raman spectroscopy; Scratching test; Silicon

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRACKS; MORPHOLOGY; OPTICAL MICROSCOPY; RAMAN SPECTROSCOPY; SILICON WAFERS; SINGLE CRYSTALS;

SCRATCHING TEST;

PHASE TRANSITIONS;

EID: 0038380753     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.2773     Document Type: Article

References (9)

1. D. R. Clarke, M. C. Kirchener, R. F. Cook and B. J. Hockey: Phys. Rev. Lett. 60 (1988) 2156.
2. J. S. Williams, Y. Chen, J. Wong-Leung, A. Kerr and M. V. Swain: J. Mater. Res. 14 (1999) 2338.
3. V. Domnich, Y. Gogotsi and S. Dub: Appl. Phys. Lett. 76 (2000) 2214.
4. T. P. Leung, W. B. Lee and X. M. Lu: J. Mater. Process. Tech. 73 (1998) 42.
5. K. Minowa and K. Sumino: Phys. Rev. Lett. 69 (1992) 320.
6. T. Iizuka and Y. Okada: Jpn. J. Appl. Phys. 33 (1994) 1427.
7. B. V. Tanikella, A. H. Somasekhar, A. T. Sowers, R. J. Nemanich and R. O. Scattergood: Appl. Phys. Lett. 69 (1996) 2870.
8. I. Zarudi and L. C. Zhang: J. Mater. Process. Tech. 84 (1998) 149.
9. J. Mencik: Strength and Fracture of Glass and Ceramics (Elsevier, Amsterdam, 1992) Chap. 2, p. 114.