-
2
-
-
0032655482
-
-
Bonard J.M., Salvetat J.P., Stockli T., Forro L., Chatelain A. Appl. Phys. A. 69:1999;245.
-
(1999)
Appl. Phys. A
, vol.69
, pp. 245
-
-
Bonard, J.M.1
Salvetat, J.P.2
Stockli, T.3
Forro, L.4
Chatelain, A.5
-
4
-
-
0032620880
-
-
Zhu W., Bower C., Zhou O., Kochanski G., Jin S. Appl. Phys. Lett. 75:1999;873.
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 873
-
-
Zhu, W.1
Bower, C.2
Zhou, O.3
Kochanski, G.4
Jin, S.5
-
6
-
-
0035848125
-
-
Choi W.B., Jin Y.W., Kim H.Y., Lee S.J., Yun M.J., Kang J.H., Choi Y.S., Park N.S., Lee N.S., Kim J.M. Appl. Phys. Lett. 78:2001;1547.
-
(2001)
Appl. Phys. Lett.
, vol.78
, pp. 1547
-
-
Choi, W.B.1
Jin, Y.W.2
Kim, H.Y.3
Lee, S.J.4
Yun, M.J.5
Kang, J.H.6
Choi, Y.S.7
Park, N.S.8
Lee, N.S.9
Kim, J.M.10
-
7
-
-
0038767305
-
-
Chen L.C., Hong W.K., Tarntair F.G., Chen K.J., Lin J.B., Kichambare P.D., Cheng H.C., Chen K.H. New Diamond Front. Carbon Technol. 354:2001;249.
-
(2001)
New Diamond Front. Carbon Technol.
, vol.354
, pp. 249
-
-
Chen, L.C.1
Hong, W.K.2
Tarntair, F.G.3
Chen, K.J.4
Lin, J.B.5
Kichambare, P.D.6
Cheng, H.C.7
Chen, K.H.8
-
8
-
-
79956023354
-
-
Chung D.-S., Park S.H., Lee H.W., Choi J.H., Cha S.N., Kim J.W., Jang J.E., Min K.W., Cho S.H., Yoon M.J., Lee J.S., Lee C.K., Yoo J.H., Kim J.-M., Jung J.E., Jin Y.W., Park Y.J., You J.B. Appl. Phys. Lett. 80:2002;4045.
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 4045
-
-
Chung, D.-S.1
Park, S.H.2
Lee, H.W.3
Choi, J.H.4
Cha, S.N.5
Kim, J.W.6
Jang, J.E.7
Min, K.W.8
Cho, S.H.9
Yoon, M.J.10
Lee, J.S.11
Lee, C.K.12
Yoo, J.H.13
Kim, J.-M.14
Jung, J.E.15
Jin, Y.W.16
Park, Y.J.17
You, J.B.18
-
9
-
-
0035804682
-
-
Lee Y.H., Jang Y.T., Kim D.H., Ahn J.H., Ju B.K. Adv. Mater. 13:2001;479.
-
(2001)
Adv. Mater.
, vol.13
, pp. 479
-
-
Lee, Y.H.1
Jang, Y.T.2
Kim, D.H.3
Ahn, J.H.4
Ju, B.K.5
-
11
-
-
79958226945
-
-
Bower C., Zhu W., Shalom D., Lopez D., Chen L.H., Gammel P.L., Jin S. Appl. Phys. Lett. 80:2002;3820.
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 3820
-
-
Bower, C.1
Zhu, W.2
Shalom, D.3
Lopez, D.4
Chen, L.H.5
Gammel, P.L.6
Jin, S.7
-
12
-
-
0035914794
-
-
Guillorn M.A., Melechko A.V., Merkulov V.I., Ellis E.D., Britton C.L., Simpson M.L., Lowndes D.H. Appl. Phys. Lett. 79:2001;3506.
-
(2001)
Appl. Phys. Lett.
, vol.79
, pp. 3506
-
-
Guillorn, M.A.1
Melechko, A.V.2
Merkulov, V.I.3
Ellis, E.D.4
Britton, C.L.5
Simpson, M.L.6
Lowndes, D.H.7
-
13
-
-
0036471486
-
-
Pirio G., Legagneux P., Pribat D., Teo K.B.K., Chhowalla M., Amaratunga G.A.J., Milne W.I. Nanotechnology. 13:2002;1.
-
(2002)
Nanotechnology
, vol.13
, pp. 1
-
-
Pirio, G.1
Legagneux, P.2
Pribat, D.3
Teo, K.B.K.4
Chhowalla, M.5
Amaratunga, G.A.J.6
Milne, W.I.7
-
15
-
-
0038090706
-
-
Chhowalla M., Teo K.B.K., Ducati C., Rupesinghe N.L., Amaratunga G.A.J., Ferrari A.C., Roy D., Robertson J., Milne W.I. J. Appl. Phys. 90:2001;10.
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 10
-
-
Chhowalla, M.1
Teo, K.B.K.2
Ducati, C.3
Rupesinghe, N.L.4
Amaratunga, G.A.J.5
Ferrari, A.C.6
Roy, D.7
Robertson, J.8
Milne, W.I.9
-
16
-
-
0032655482
-
-
Bonard J.M., Salvetat J.P., Stockli T., Forro L., Chatelain A. Appl. Phys. A. 69:(3):1999;245-254.
-
(1999)
Appl. Phys. A
, vol.69
, Issue.3
, pp. 245-254
-
-
Bonard, J.M.1
Salvetat, J.P.2
Stockli, T.3
Forro, L.4
Chatelain, A.5
-
17
-
-
0033723428
-
-
Choi W.B., Lee Y.H., Lee N.S., Kang J.H., Park S.H., Kim H.Y., Chung D.S., Lee S.M., Chung S.Y., Kim J.M. Jpn. J. Appl. Phys. Part 1. 39:(5A):2000;2560-2564.
-
(2000)
Jpn. J. Appl. Phys. Part 1
, vol.39
, Issue.5 A
, pp. 2560-2564
-
-
Choi, W.B.1
Lee, Y.H.2
Lee, N.S.3
Kang, J.H.4
Park, S.H.5
Kim, H.Y.6
Chung, D.S.7
Lee, S.M.8
Chung, S.Y.9
Kim, J.M.10
-
19
-
-
0032655482
-
-
Bonard J.M., Salvetat J.P., Stockli T., Forro L., Chatelain A. Appl. Phys. A. 69:(3):1999;245-254.
-
(1999)
Appl. Phys. A
, vol.69
, Issue.3
, pp. 245-254
-
-
Bonard, J.M.1
Salvetat, J.P.2
Stockli, T.3
Forro, L.4
Chatelain, A.5
-
21
-
-
0035806033
-
-
Kuzumaki T., Takamura Y., Ichinose H., Horiike Y. Appl. Phys. Lett. 78:(23):2001;3699-3701.
-
(2001)
Appl. Phys. Lett.
, vol.78
, Issue.23
, pp. 3699-3701
-
-
Kuzumaki, T.1
Takamura, Y.2
Ichinose, H.3
Horiike, Y.4
-
22
-
-
0034825622
-
-
Bonard J.M., Weiss N., Kind H., Stockli T., Forro L., Kern K., Chatelain A. Adv. Mater. 13:(3):2001;184-188.
-
(2001)
Adv. Mater.
, vol.13
, Issue.3
, pp. 184-188
-
-
Bonard, J.M.1
Weiss, N.2
Kind, H.3
Stockli, T.4
Forro, L.5
Kern, K.6
Chatelain, A.7
-
23
-
-
17944389919
-
-
Lee S.-B., Teo K.B.K., Chhowalla M., Hasko D.G., Amaratunga G.A.J., Milne W.I., Ahmed H. Microelectron. Eng. 61-62:2002;475.
-
(2002)
Microelectron. Eng.
, vol.61-62
, pp. 475
-
-
Lee, S.-B.1
Teo, K.B.K.2
Chhowalla, M.3
Hasko, D.G.4
Amaratunga, G.A.J.5
Milne, W.I.6
Ahmed, H.7
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