High rate deposition of diamond like carbon films by very high frequency plasma enhanced chemical vapor deposition at 100 MHz

Journal of Applied Physics

Volumn 93, Issue 10 1, 2003, Pages 6361-6369

  Kumar, Sushil ^a   Dixit, P N ^a   Sarangi, D ^b   Bhattacharyya, R ^a  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; FILM GROWTH; HARDNESS; HYDROGEN BONDS; INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX;

OPTICAL BAND GAP;

DIAMOND LIKE CARBON FILMS;

EID: 0038282636     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1561997     Document Type: Article

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