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Volumn 77, Issue 1, 2003, Pages 117-123
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Near field induced defects and influence of the liquid layer thickness in steam laser cleaning of silicon wafers
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CLEANING;
COLLOIDS;
CRYSTAL DEFECTS;
EVAPORATION;
GRAIN SIZE AND SHAPE;
LASER ABLATION;
LASER APPLICATIONS;
POLYSTYRENES;
SUBSTRATES;
THERMAL EXPANSION;
VAPORIZATION;
LASER INDUCED EVAPORATION;
LIQUID LAYER THICKNESS;
STEAM LASER CLEANING;
SILICON WAFERS;
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EID: 0038207915
PISSN: 09478396
EISSN: None
Source Type: Journal
DOI: 10.1007/s00339-003-2101-0 Document Type: Article |
Times cited : (47)
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References (19)
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