Aluminum silicate films obtained by low-pressure metal-organic chemical vapor deposition

Journal of the American Ceramic Society

Volumn 86, Issue 6, 2003, Pages 969-974

  Kuo, Dong Hau ^a   Chuang, Po Yo ^b  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ALUMINA; ARGON; COMPOSITION; GLASS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; SILICA; SILICON; SUBSTRATES; TEMPERATURE; THIN FILMS;

ALUMINUM SILICATE FILMS; ALUMINUM TRISECBUTOXIDE; HEXAMETHYLDISILAZANE; LOW PRESSURE METAL ORGANIC CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0038206797     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2003.tb03404.x     Document Type: Article

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