Experimental and theoretical DOS of Co and Ni silicides

Surface Science

Volumn 532-535, Issue , 2003, Pages 952-956

  Garcia Mendez M ^a   Farias M H ^b   Galvan Martinez D H ^b   Posada Amarillas, A ^c   Beamson, G ^d  

^a UNIVERSIDAD AUTÓNOMA DE NUEVO LEÓN   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c UNIVERSIDAD DE SONORA   (Mexico)

^d DARESBURY LABORATORY   (United Kingdom)

Author keywords

Electron density, excitation spectra calculations; Silicides; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; ELECTRONIC DENSITY OF STATES; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICIDATION;

SEMICONDUCTING FILMS;

EID: 0038182999     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00133-X     Document Type: Conference Paper

References (19)

1. Reader A.H., von Ommen A.H., Meijs P.J.W., Woltars R.A.M., Oostra D.J. Rep. Prog. Phys. 56:1992;1397.
2. Zhu D.H., Chen Y.G., Liu B.X. Nucl. Instrum. Meth. Phys. Res. B. 101:1995;394.
3. Poon M.C., Deng F., Chan M., Chan W.Y., Lau S.S. Appl. Surf. Sci. 157:2000;29.
4. Detavernier C., Van Meirhaeghe T.R.L., Cardon F., Maex K. Thin Solid Films. 384:2001;243.
5. Kurmaev E.Z., Shamin S.N., Galakhov V.R., Kasko I. Thin Solid Films. 311:1997;28.
6. U. Gottlieb, F. Nava, M. Affronte, O. Laborde, R. Madar, Electrical transport in TM silicides, in: K. Maex, M. van Rossum (Eds.), Properties of Metal Silicides, first ed., Inspec Data Review Series, vol. 14, London, 1995, pp. 189-204.
7. J. Derrien, Electronic band structure in TM silicides, in: K. Maex, M. van Rossum (Eds.), Properties of Metal Silicides, first ed., Inspec Data Review Series, vol. 14, London, 1995, pp. 155-163.
8. Hara S., Ohdomari I. Phys. Rev. B. 38:1998;7554.
9. Kim K.H., Kang J.S., Choi C.K., Lee J.Y., Olson C.G. Appl. Surf. Sci. 150:1999;8.
10. Kurganskii S.I., Pereslavtseva N.S. Phys. Solid State. 42:2000;1542.
11. Kurganskii S.I., Pereslavtseva N.S. Phys. Status Solidi B. 218:2000;431.
12. Watts J.F. X-ray photoelectron spectroscopy. Walls J.M., Smith R. Surface Science Techniques. first ed. 1994;5-24 Pergamon Press, Elsevier Science, Oxford.
13. Beamson G., Briggs D. High Resolution XPS of Organic Polymers, The Scienta Esca 300 Database. 1992;John Wiley and Sons Inc. Chichester, UK.
14. García-Méndez M., Castillón F.F., Hirata G.A., Farías M.H., Beamson G. Appl. Surf. Sci. 161:2000;61.
15. G.A. Landrum, YAeHMOP (Yet Another extended Hückel Molecular Orbital Program) version 3.0, Cornell University, Ithaca, New York, 1999.
16. Álvarez S. Tables of Parameters for Extended Hückel Calculations. 1993;Universitat de Barcelona, Barcelona.
17. Galván D.H., Garzón I.L., Santiago P., Yacamán M.J. Fullerene Sci. Technol. 6:1998;867.
18. Kim B., Kim K.J., Kang T.H. Appl. Surf. Sci. 152:1999;44.
19. van der Marel D., Damascelli A., Schulte K., Menovsky A.A. Physica B. 244:1998;138.