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Volumn 16, Issue 4, 2003, Pages 549-556
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Introducing 157nm full field lithography
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Author keywords
157 nm resists; F2; Hard pellicles; Integration; Lithography; VUV cleaning
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Indexed keywords
ARTICLE;
CHEMISTRY;
COMPUTER PROGRAM;
FEASIBILITY STUDY;
IMAGE ANALYSIS;
IMAGING SYSTEM;
LITHOGRAPHY;
MEASUREMENT;
OPTICS;
TECHNOLOGY;
ULTRAVIOLET RADIATION;
VACUUM;
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EID: 0038168529
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.16.549 Document Type: Article |
Times cited : (12)
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References (26)
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