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Volumn 10, Issue 2, 2003, Pages 171-178

Use of HMDS/hexane double layers for obtaining low cost selective membrane

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE; PLASMAS; POROSITY; SUBSTRATES; THIN FILMS;

EID: 0038162386     PISSN: 09690239     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1024099329956     Document Type: Article
Times cited : (13)

References (13)
  • 1
    • 18144451047 scopus 로고    scopus 로고
    • Low temperature deposition of SiC thin films on polymer surface by plasma CVD
    • Anma H., Yoshimoto Y., Warashina M. and Hatanaka Y. 2001. Low temperature deposition of SiC thin films on polymer surface by plasma CVD. Appl. Surface Sci. 175: 484-489.
    • (2001) Appl. Surface Sci. , vol.175 , pp. 484-489
    • Anma, H.1    Yoshimoto, Y.2    Warashina, M.3    Hatanaka, Y.4
  • 6
    • 0031188990 scopus 로고    scopus 로고
    • Characterization of amorphous SiC:H films deposited from hexamethyldisilazane
    • Lee J. and Kim M.T. 1997. Characterization of amorphous SiC:H films deposited from hexamethyldisilazane. Thin Solid Films 303: 173-179.
    • (1997) Thin Solid Films , vol.303 , pp. 173-179
    • Lee, J.1    Kim, M.T.2
  • 7
    • 0035387765 scopus 로고    scopus 로고
    • Anti-reflective coating for the deep coloring of PET fabrics using an atmospheric pressure plasma technique
    • Lee H.R., Kim D.J. and Lee K.H. 2001. Anti-reflective coating for the deep coloring of PET fabrics using an atmospheric pressure plasma technique. Surface Coatings Technol. 142: 468-473.
    • (2001) Surface Coatings Technol. , vol.142 , pp. 468-473
    • Lee, H.R.1    Kim, D.J.2    Lee, K.H.3
  • 8
    • 84957272341 scopus 로고
    • Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation
    • Lucovsky G. and Tsu D.V. 1987. Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation. J. Vacuum Sci. Technol. A5: 2231-2238.
    • (1987) J. Vacuum Sci. Technol. , vol.5 A , pp. 2231-2238
    • Lucovsky, G.1    Tsu, D.V.2
  • 10
    • 0033976089 scopus 로고    scopus 로고
    • Modification of surface properties of alumina by plasma treatment
    • Pereira G.J., Silva M.L.P., Tan I.H. and Gouvea D. 2000. Modification of surface properties of alumina by plasma treatment. J. Mat. Chem. 10: 259-261.
    • (2000) J. Mat. Chem. , vol.10 , pp. 259-261
    • Pereira, G.J.1    Silva, M.L.P.2    Tan, I.H.3    Gouvea, D.4
  • 11
    • 0035386415 scopus 로고    scopus 로고
    • Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters
    • Shirtcliffe N., Thiemann P., Stratmann M. and Grundmeier G. 2001. Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters. Surface Coatings Technol. 142: 1121-1128.
    • (2001) Surface Coatings Technol. , vol.142 , pp. 1121-1128
    • Shirtcliffe, N.1    Thiemann, P.2    Stratmann, M.3    Grundmeier, G.4
  • 13
    • 0035048249 scopus 로고    scopus 로고
    • Paper surface modification by plasma deposition of double layers of organic silicon compounds
    • Tan I.H., Silva M.L.P. and Demarquette N. 2001. Paper surface modification by plasma deposition of double layers of organic silicon compounds. J. Mat. Chem. 11: 1019-1025.
    • (2001) J. Mat. Chem. , vol.11 , pp. 1019-1025
    • Tan, I.H.1    Silva, M.L.P.2    Demarquette, N.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.