Defect formation in hafnium dioxide thin films

Applied Optics

Volumn 39, Issue 10, 2000, Pages 1589-1599

  Reicher, David ^a   Black, Paul ^b   Jungling, Kenneth ^c  

^a S Systems Corporation   (United States)

^b BOEING COMPANY   (United States)

^c UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFECTS; ELECTRON BEAMS; FUSED SILICA; GROWTH (MATERIALS); HAFNIUM COMPOUNDS; LIGHT REFLECTION; LIGHT TRANSMISSION; SPECTROPHOTOMETRY; SURFACE TOPOGRAPHY; X RAY DIFFRACTION;

ELECTRON-BEAM EVAPORATED FILMS;

THIN FILMS;

EID: 0038154091     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.001589     Document Type: Article

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