Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system

Applied Optics

Volumn 35, Issue 25, 1996, Pages 5095-5101

  Chow, Robert ^a   Tsujimoto, Nick ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b MDC Vacuum Products   (United States)

Author keywords

E beam evaporation; Experimental design strategy; Hafnium dioxide; Silicon dioxide

Indexed keywords

EID: 0037905543     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.005095     Document Type: Article

References (6)

1. R. Chow, S. Falabella, G. E. Loomis, F. Rainer, C. J. Stolz, and M. R. Kozlowski, “Reactive evaporation of low defect density hafnia, ” Appl. Opt. 32, 5567-2274 (1993).
2. R. J. Tench, M. R. Kozlowski, and R. Chow, “Defect geometries and laser-induced damage in multilayer coatings, ” in Proceedings of Optical Thin Film IV: New Developments, J. D. Rancourt, ed. Proc. SPIE 2262, 60-66 (1994).
3. H. K. Pulker, Coatings on Glass, 3rd ed. (Elsevier, Amsterdam, 1987), Chap. 6, p. 177, Eq. 59.
4. D. H. Doehlert, Basic Experimental Strategies, 6th ed. (The Experimental Strategies Foundation, Seattle, Wash., 1992), Chaps. 11, 13, and 21.
5. R. J. Hill, ed., Physical Vapor Deposition (Temescal, Berkeley, Calif., 1986), p. 46.
6. H. R. Smith, “Deposition distribution and rates from electron-beam-heated vapor sources, ” in the Society of Vacuum Coaters Twelfth Annual Technical Conference Proceedings (Society of Vacuum Coaters, Albuquerque, N.M., 1969), pp. 50-54.