![]() |
Volumn 42, Issue 4 B, 2003, Pages 1933-1936
|
Metal-induced solid-phase crystallization of amorphous SiGe films on insulator
|
Author keywords
Metal induced lateral crystallization; Needlelike crystal; Nickel silicide; Silicon germanium; Thin film transistor
|
Indexed keywords
ANNEALING;
CRYSTALLIZATION;
GRAIN SIZE AND SHAPE;
OPTICAL MICROSCOPY;
POLYCRYSTALLINE MATERIALS;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTING SILICON COMPOUNDS;
SILICA;
THIN FILM TRANSISTORS;
ULSI CIRCUITS;
METAL-INDUCED SOLID-PHASE CRYSTALLIZATION;
NEEDLELIKE CRYSTAL;
NOMARSKI OPTICAL MICROSCOPY;
AMORPHOUS FILMS;
|
EID: 0038010026
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.42.1933 Document Type: Article |
Times cited : (18)
|
References (13)
|