Development of a large-area, multi-helicon rectangular plasma source for TFT-LCD processing

Thin Solid Films

Volumn 435, Issue 1-2, 2003, Pages 270-274

  Kim, Yoon Jae ^a   Han, Seung Ho ^a   Hwang, Won ^a   Hwang, Y S ^a  

^a Seoul National University   (South Korea)

Author keywords

Helicon plasma; Large area plasma source; Low field density peak; Very high frequency discharge

Indexed keywords

INDUCTIVELY COUPLED PLASMA; LIQUID CRYSTAL DISPLAYS; MAGNETIC FIELDS; PLASMA DENSITY;

CAPACITIVELY COUPLED PLASMA (CCP);

PLASMA SOURCES;

EID: 0038009036     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00398-5     Document Type: Conference Paper

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