Effect of heat treatment on electric properties of Bi4Ti3O12 thin films by two-dimensional RF magnetron sputtering

IEEE International Symposium on Applications of Ferroelectrics

Volumn , Issue , 2002, Pages 167-170

  Kudoh, K ^a   Higuchi, T ^a   Iwasa, M ^a   Hosomizu, M ^a   Tsukamoto, T ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; COERCIVE FORCE; HEAT TREATMENT; HYSTERESIS; MAGNETRON SPUTTERING; PERMITTIVITY; STOICHIOMETRY;

HYSTERESIS LOOP;

FERROELECTRIC THIN FILMS;

EID: 0038003828     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)

1. E. C. Subbarao: Phys. Rev. 122 (1961) 804.
2. S. E. Cummins and L. E. Cross: Appl. Phys. Lett. 10 (1967) 14.
3. R. W. Wolfe and R. E. Newnham: J. Electrochem. Soc. 116 (1967) 832.
4. A. Kakimi. S. Okamura and T. Tsukamoto: Jpn. J. Appl. Phys. 33 (1994) L 1707.
5. S. Okamura, Y. Yagi, K. Mori, G. Fujihashi, S. Ando and T. Tsukamoto: Jpn. J. Appl. Phys. 36 (1997) 5889.
6. M. Yamaguchi and T. Nagatomo: Thin Solid Films 348 (1999) 294.
7. R. Muhammet, T. Nakamura, M. Shimizu and T. Shiosaki: Jpn. J. Appl. Phys. 33 (1994) 5215.
8. T. Tsukamoto and S. Okamura: Ferroelectrics 170 (1995) 77.
9. T. Kijima and H. Matsunaga: Jpn. J. Appl. Phys. 37 (1998) 5171.
10. T. Watanabe and H. Funakubo: Jpn. J. Appl. Phys. 39 (2000) 5211.
11. T. Watanabe, A. Saiki, K. Saito and H. Funakubo: J. Appl. Phys. 89 (2001) 3934.
12. T. Watanabe, H. Funakubo, M. Osada, Y. Noguchi and M. Miyayama: Appl. Phys. Lett. 80 (2002) 100.
13. Y. Masuda, H. Masumoto, A. Baba, T. Goto and T. Hirai: Jpn. J. Appl. Phys. 32 (1993) 4043.
14. W. Jo, S. M. Cho, H. M. Lee, D. C. Kim and J. U. Bu: Jpn. J. Appl. Phys. 38 (1999) 2827.
15. M. Tanaka, T. Higuchi, K. Kudoh and T. Tsukamoto: Jpn. J. Appl. Phys. 41 (2002) 1536.
16. K. Kudoh, T. Higuchi, Y. Iwasa, M. Hosomizu and T. Tsukamoto: in preparation.
17. T. Higuchi, M. Tanaka, K. Kudoh, T. Takeuchi, S. Shin and T. Tsukamoto: Jpn. J. Appl. Phys. 40 (2001) 5803.