Secondary ion emission from a water and fluorine adsorbed Si(1 0 0) surface irradiated with electrons and highly charged ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 205, Issue , 2003, Pages 725-729

  Okabayashi, N ^a,b   Komaki, K ^a   Yamazaki, Y ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b RIKEN   (Japan)

Author keywords

Electron stimulated desorption; Fluorine; Highly charged ions; Hydrogen; Si(1 0 0)

Indexed keywords

DESORPTION; FLUORINE; HYDROGEN;

SECONDARY ION EMISSION PHENOMENA;

SILICON;

EID: 0037994030     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00566-4     Document Type: Conference Paper

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