Lead chalcogenide on silicon infrared sensor arrays

Opto-Electronics Review

Volumn 1998, Issue 1, 1998, Pages 37-46

  Zogg, H ^a   John, J ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037992185     PISSN: 12303402     EISSN: 18963757     Source Type: Journal    
DOI: None     Document Type: Article

References (25)

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24. The chip was designed by W. Buttler, Essen, D, and fabricated at the Fraunhofer-Institut für mikroelektronische Schaltungen und Systeme, Duisburg, D.
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