Substrate-induced stress and the transformation behavior of sputter-deposited NiTi thin films

Materials Science and Engineering: A

Volumn 352, Issue 1-2, 2003, Pages 314-317

  Huang, Xu ^a   Liu, Yong ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Phase transformation; Shape memory; Sputtering; Thin film; X ray diffraction

Indexed keywords

NICKEL COMPOUNDS; PHASE TRANSITIONS; SPUTTER DEPOSITION; STRESS ANALYSIS; SUBSTRATES;

STRESS-TEMPERATURE LOOP;

THIN FILMS;

SPUTTERING;

EID: 0037982588     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(02)00933-4     Document Type: Article

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