Optical inspection of EUV and SCALPEL reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 710-717

  Pettibone, Donald W ^a   Stokowski, Stan ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Defects; EPL; EUV; Mask inspection; Next generation lithography; NGL; PREVAIL; SCALPEL; Stencil mask

Indexed keywords

COMPUTER SIMULATION; DEFECTS; IMAGE QUALITY; IMAGING SYSTEMS; INSPECTION; INTEGRATED CIRCUIT LAYOUT; MASKS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET; MASK INSPECTION; NEXT GENERATION LITHOGRAPHY; OPTICAL INSPECTION; STENCIL MASK;

PHOTOLITHOGRAPHY;

EID: 0035179884     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438384     Document Type: Article

References (5)

1. UV inspection of EUV and SCALPEL reticles
2. The scalpel lithography system
3. PREVAIL - IBM's E-beam technology for next generation lithography
4. EUV lithography - The successor to optical lithography?