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Volumn 39, Issue 19, 2000, Pages 3253-3260

Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; COHERENT LIGHT; COMPUTER SIMULATION; IMAGING SYSTEMS; LITHOGRAPHY;

EID: 0037815088     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.003253     Document Type: Article
Times cited : (3)

References (15)
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  • 2
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  • 5
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    • Haga, T.1    Kinoshita, H.2
  • 7
    • 0027806880 scopus 로고
    • Physical optics modeling in soft-x-ray projection lithography
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  • 9
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    • (1993) Appl. Opt. , vol.32 , pp. 6938-6944
    • Sommargren, G.E.1    Seppala, L.G.2
  • 10
    • 84893887558 scopus 로고
    • Critical illumination condenser for EUV projection lithography
    • D. Attwood and F. Zernike, eds, of OSA Proceedings Series (Optical Society of America, Washington, D.C
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.