Substrate influence on the properties of doped thin silicon layers grown by Cat-CVD

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 157-160

  Soler, D ^a   Fonrodona, M ^a   Voz, C ^b   Asensi, J M ^a   Bertomeu, J ^a   Andreu, J ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

^b UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

Author keywords

Amorphous silicon; Catalytic chemical vapour deposition; Doping; Nanocrystalline silicon

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); MICROSTRUCTURE; SUBSTRATES;

NANOCRYSTALLINE SILICON;

THIN FILMS;

EID: 0037809504     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00095-6     Document Type: Conference Paper

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