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Volumn 93, Issue 12, 2003, Pages 10146-10147
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Comment on "(Ta1-xNbx)2O5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature i-v characteristics" [J. Appl. Phys. 90, 4532 (2001)]
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Author keywords
[No Author keywords available]
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Indexed keywords
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRON TRAPS;
ELECTRON TUNNELING;
PERMITTIVITY;
SPECTROSCOPIC ANALYSIS;
TANTALUM COMPOUNDS;
FRENKEL EMISSION;
THIN FILMS;
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EID: 0037805178
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1571961 Document Type: Review |
Times cited : (3)
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References (16)
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