Synthesis and characterization of BON thin films using low frequency RF plasma enhanced MOCVD: Effect of deposition parameters on film hardness

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 281-286

  Chen, G C ^a   Kim, M C ^a   Han, J G ^a   Lee, S B ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

BON film; Hardness; Low frequency RF; Plasma enhanced MOCVD

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROHARDNESS; NITROGEN; PLASMA SOURCES; SYNTHESIS (CHEMICAL); THERMAL EFFECTS;

HARD MATERIALS;

THIN FILM CIRCUITS;

COATING; FILM; HARDNESS; PLASMA TREATMENT; SURFACE TREATMENT; SYNTHESIS;

EID: 0037792993     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00056-2     Document Type: Article

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