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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 4 A, 2003, Pages

Thermal effect of picosecond-pulsed laser irradiation on Cl-adsorbed Si(111) surface

(5) Shirao, Tetsuro a,b Shudo, Ken Ichi a,b Tanaka, Yoshihito a Ishikawa, Tetsuya a Tanaka, Masatoshi b

a RIKEN SPring 8 Center (Japan)

b YOKOHAMA NATIONAL UNIVERSITY (Japan)

Author keywords

Chlorine; Pulsed laser; Silicon; Thermal desorption

Indexed keywords

ADSORPTION; ANISOTROPY; CHLORINE; CRYSTAL DEFECTS; CRYSTAL LATTICES; DESORPTION; IRRADIATION; MASS SPECTROMETRY; POLARIZATION; SEMICONDUCTING SILICON; THERMAL EFFECTS;

LASER IRRADIATION; PICOSECOND PULSED LASER IRRADIATION; POLYCHLORIDES; SILICON CHLORIDES;

PULSED LASER APPLICATIONS;

EID: 0037733931 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.l386 Document Type: Letter

Times cited : (2)

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