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Volumn 353, Issue 1-2, 2003, Pages 119-125
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Microstructure-controlled interdiffusion of Cu/Co/Au thin films investigated by three-dimensional atom probe
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Author keywords
Cu Au; Diffusion barrier; Field ion microscopy; Grain boundary reaction; Interdiffusion; Nanocrystalline materials; Thin films; Tomographic atom probe
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Indexed keywords
COBALT;
COPPER;
CRYSTAL ATOMIC STRUCTURE;
GOLD;
GRAIN BOUNDARIES;
INTERDIFFUSION (SOLIDS);
INTERMETALLICS;
MICROSTRUCTURE;
MULTILAYERS;
SINGLE CRYSTALS;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
FIELD ION MICROSCOPY (FIM);
THIN FILMS;
FILM;
MICROSCOPY;
MICROSTRUCTURE;
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EID: 0037708441
PISSN: 09215093
EISSN: None
Source Type: Journal
DOI: 10.1016/s0921-5093(02)00677-9 Document Type: Article |
Times cited : (13)
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References (16)
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