X-ray photoelectron diffraction on SiC and AlN epitaxial films: Polytype structure and polarity

Journal of Electron Spectroscopy and Related Phenomena

Volumn 114-116, Issue , 2001, Pages 443-450

  Schröter, Bernd ^a   Winkelmann, Aimo ^a   Richter, Wolfgang ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CONTAMINATION; ELECTRON DIFFRACTION; FILM GROWTH; LIGHT SCATTERING; MOLECULAR BEAM EPITAXY; MONOLAYERS; SEMICONDUCTING ALUMINUM COMPOUNDS; SENSITIVITY ANALYSIS; SILICON CARBIDE; SINGLE CRYSTALS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE-SCANNED X RAY PHOTOELECTRON DIFFRACTION; SINGLE-SCATTERING CLUSTER THEORY;

SEMICONDUCTING FILMS;

EID: 0037698085     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0368-2048(00)00301-7     Document Type: Article

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