Polytype and surface characterization of silicon carbide thin films

Materials Science Forum

Volumn 264-268, Issue PART 1, 1998, Pages 355-358

  Schroter B ^a   Kreuzberg, M ^a   Fissel, A ^a   Pfennighaus, K ^a   Richter, W ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Electron Channeling Pattern; Epitaxial Film; Photoelectron Diffraction; Polytype; Surface Structure

Indexed keywords

CRYSTAL SYMMETRY; FILM GROWTH; MOLECULAR BEAM EPITAXY; SILICON CARBIDE; SURFACE STRUCTURE; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON CHANNELING PATTERNS (ECP);

SEMICONDUCTING FILMS;

EID: 0031698878     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.264-268.355     Document Type: Article

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