Mechanical properties of (Ti,Cr)N coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 424-427

  Jung, D H ^a   Park, H S ^a   Na, H D ^a   Lim, J W ^a   Lee, J J ^a   Joo, J H ^b  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

(Ti,Cr)N; Hardness; ICP sputtering; Protective coating

Indexed keywords

DEPOSITION; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; MICROHARDNESS; RESIDUAL STRESSES;

DIRECT CURRENT MAGNETRON SPUTTERING;

COATINGS;

COATING; HARDNESS; NITRIDE; PLASMA TREATMENT; PROTECTION; SPUTTERING; SURFACE TREATMENT;

EID: 0037671434     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00146-4     Document Type: Article

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