Reversible chemical patterning on stimuli-responsive polymer film: Environment-responsive lithography

Journal of the American Chemical Society

Volumn 125, Issue 27, 2003, Pages 8302-8306

  Ionov, Leonid ^a   Minko, Sergiy ^a,b   Stamm, Manfred ^a   Gohy, Jean François ^c   Jéróme, Robert ^c   Scholl, Andreas ^d  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

^b CLARKSON UNIVERSITY   (United States)

^c UNIVERSITY OF LIÈGE   (Belgium)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; LITHOGRAPHY; POLYMERS; SOLVENTS;

POLYMER FILMS;

PLASTIC FILMS;

ISOPRENE; POLYMER; PYRIDINE DERIVATIVE;

ADSORPTION; ARTICLE; CROSS LINKING; EXPOSURE; FILM; ILLUMINATION; INTERMETHOD COMPARISON; LITHOGRAPHY; PH MEASUREMENT; PRINTING; TEMPERATURE; WETTABILITY;

EID: 0037668135     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja035560n     Document Type: Article

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