Photocrosslinking of thin films of temperature-sensitive polymers

Polymers for Advanced Technologies

Volumn 10, Issue 6, 1999, Pages 345-352

  Kuckling, Dirk ^a   Adler, Hans Jürgen P ^a   Arndt, Karl Friedrich ^a   Hoffmann, Jan ^a   Plötner, Matthias ^a   Wolff, Thomas ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Patterning; Photocrosslinking; Poly(N isopropylacrylamide); Temperature sensitive networks

Indexed keywords

CHROMOPHORES; COPOLYMERS; CROSSLINKING; DIFFERENTIAL SCANNING CALORIMETRY; INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; POLYAMIDES; SWELLING; THERMAL EFFECTS; ULTRAVIOLET SPECTROSCOPY;

PHOTOCROSSLINKING; POLYISOPROPYLACRYLAMIDE; TEMPERATURE SENSITIVE POLYMERS;

PLASTIC FILMS;

EID: 0033363946     PISSN: 10427147     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-1581(199906)10:6<345::AID-PAT885>3.0.CO;2-N     Document Type: Article

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