RandD of diamond films in the Frontier Carbon Technology Project and related topics

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 233-240

  Kobashi, Koji ^a   Nishibayashi, Yoshiki ^a   Yokota, Yoshihiro ^a   Ando, Yutaka ^a   Tachibana, Takeshi ^b   Kawakami, Nobuyuki ^b   Hayashi, Kazushi ^b   Inoue, Kenichi ^b   Meguro, Kiichi ^c   Imai, Hiroshi ^c   Furuta, Hiroshi ^a   Hirao, Takashi ^a   Oura, Kenjiro ^a   Gotoh, Yasuhito ^d   Nakahara, Hironori ^d   Tsuji, Hiroshi ^d   Ishikawa, Junzo ^d   Koeck, Franz A ^e   Nemanich, Robert J ^e   Sakai, Tadashi ^f   Sakuma, Naoshi ^f   Yoshida, Hiroaki ^g   more..

^a OSAKA UNIVERSITY   (Japan)

^b KOBE STEEL LTD   (Japan)

^c SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

^d KYOTO UNIVERSITY   (Japan)

^e NORTH CAROLINA STATE UNIVERSITY   (United States)

^f TOSHIBA CORPORATION   (Japan)

^g Res Ctr for Adv Carbon Materials   (Japan)

Author keywords

Chemical vapor deposition; Diamond films; Etching; Field emission

Indexed keywords

CARBON; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTALS; FILM GROWTH; MORPHOLOGY;

CHEMICAL VAPOR DEPOSITION (CVD) REACTORS;

DIAMOND FILMS;

DIAMOND;

EID: 0037562918     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00298-4     Document Type: Article

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