Structural and electronic properties of low dielectric constant carbon rich amorphous silicon carbide

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 963-967

  Li, Xuemei ^a   Wong, T K S ^a   Rusli, ^a   Yang, Dajiang ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Amorphous SiC; Low dielectric constant; Plasma enhanced chemical vapor deposition

Indexed keywords

AMORPHOUS MATERIALS; CARBON; CHEMICAL BONDS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

X-RAY REFLECTIVITY;

SILICON CARBIDE;

DIAMOND;

EID: 0037508696     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00220-0     Document Type: Article

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