메뉴 건너뛰기




Volumn 51, Issue 1, 2002, Pages 323-326

Nano-texturing of surfaces by constricting epitaxial growth of molecules

Author keywords

Nano texture; Physical vapor deposition (PVD); Single crystal silicon

Indexed keywords

MOLECULAR BEAM EPITAXY; PHYSICAL VAPOR DEPOSITION; SILICON; SINGLE CRYSTALS;

EID: 0037501244     PISSN: 00078506     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0007-8506(07)61527-3     Document Type: Review
Times cited : (6)

References (9)
  • 1
    • 0033323243 scopus 로고    scopus 로고
    • "Structured", "textured" or "engineered" surfaces
    • Evans, C. J., Bryan, J. B., 1999, "Structured", "textured" or "engineered" surfaces, Annals of the CIRP, 48/2, 541-556.
    • (1999) Annals of the CIRP , vol.48 , Issue.2 , pp. 541-556
    • Evans, C.J.1    Bryan, J.B.2
  • 2
    • 0037621322 scopus 로고    scopus 로고
    • Complex surfaces - Applications and generation by diamond machining
    • Brinksmeier, E., Preuss, W., 1997, Complex surfaces - applications and generation by diamond machining, Proc. 12th ASPE Annual Meeting, 33-36.
    • (1997) Proc. 12th ASPE Annual Meeting , pp. 33-36
    • Brinksmeier, E.1    Preuss, W.2
  • 4
    • 0037621321 scopus 로고    scopus 로고
    • Machining of precision parts and microstructures
    • Brinksmeier, E., Riemer, O., Stern, R., 2001, Machining of precision parts and microstructures, Proc. 10th ICPE, 3-11.
    • (2001) Proc. 10th ICPE , pp. 3-11
    • Brinksmeier, E.1    Riemer, O.2    Stern, R.3
  • 6
    • 0029719816 scopus 로고    scopus 로고
    • Molecular beam epitaxy (MBE) as an ultra precision machining process
    • Furukawa, Y., Kakuta, A., 1996, Molecular beam epitaxy (MBE) as an ultra precision machining process, Annals of the CIRP, 45/1, 197-200.
    • (1996) Annals of the CIRP , vol.45 , Issue.1 , pp. 197-200
    • Furukawa, Y.1    Kakuta, A.2
  • 7
    • 0032675110 scopus 로고    scopus 로고
    • Investigation of surface formation process of silicon molecular beam epitaxy by atomic force microscopy
    • Furukawa, Y., Kaneko, A., 1999, Investigation of surface formation process of silicon molecular beam epitaxy by atomic force microscopy, Annals of the CIRP, 48/1, 453-457.
    • (1999) Annals of the CIRP , vol.48 , Issue.1 , pp. 453-457
    • Furukawa, Y.1    Kaneko, A.2
  • 8
    • 0033700934 scopus 로고    scopus 로고
    • An analysis of surface properties of hetero-epitaxially grown SiC surface on Si substrate
    • Moronuki N., Furukawa Y., 2000, An analysis of surface properties of hetero-epitaxially grown SiC surface on Si substrate, Annals of the CIRP, 49/1, 447-450.
    • (2000) Annals of the CIRP , vol.49 , Issue.1 , pp. 447-450
    • Moronuki, N.1    Furukawa, Y.2
  • 9
    • 0031625406 scopus 로고    scopus 로고
    • An analysis of physico-chemical process of reactive ion etching (RIE) to adapt for three dimensional micro-machining
    • Furukawa, Y., Kakuta, A., 1998, An analysis of physico-chemical process of reactive ion etching (RIE) to adapt for three dimensional micro-machining, Annals of the CIRP, 47/1, 149-152.
    • (1998) Annals of the CIRP , vol.47 , Issue.1 , pp. 149-152
    • Furukawa, Y.1    Kakuta, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.