Molecular Beam Epitaxy (MBE) as an Ultraprecision Machining Process

CIRP Annals - Manufacturing Technology

Volumn 45, Issue 1, 1996, Pages 197-200

  Furukawa, Yuji ^a   Kakuta, Akira ^a  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

PVD; Silicon surface machining; Ultra precision machining

Indexed keywords

CRYSTAL STRUCTURE; MACHINING; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SUBSTRATES; VAPOR DEPOSITION;

HOMOEPITAXY; PHYSICAL VAPOR DEPOSITION; ULTRAPRECISION MACHINING;

MOLECULAR BEAM EPITAXY;

EID: 0029719816     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/S0007-8506(07)63046-7     Document Type: Article

References (5)

1. Guide of MBE
2. Physics of vacuum and its application
3. Low temperature surface cleaning of Silicon and its application to Silicon MBE