Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

Surface and Coatings Technology

Volumn 167, Issue 2-3, 2003, Pages 288-291

  Yang, D J ^a   Zhang, Q ^a   Yoon, S F ^a   Ahn, J ^a   Wang, S G ^a   Zhou, Q ^a   Wang, Q ^a   Li, J Q ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Carbon nanotubes; Microwave plasma enhanced chemical vapor deposition (MPECVD); Nitrogen; Oxygen

Indexed keywords

CATALYSTS; COMPOSITION; GRAIN SIZE AND SHAPE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL);

CATALYST GRAINS;

CARBON NANOTUBES;

CARBON; CHEMICAL VAPOR DEPOSITION; COATING; NITROGEN; OXYGEN;

EID: 0037461189     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00921-0     Document Type: Article

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