Tuning copper-dioxygen reactivity and exogenous substrate oxidations via alterations in ligand electronics

Journal of the American Chemical Society

Volumn 125, Issue 3, 2003, Pages 634-635

  Zhang, Christiana Xin ^a   Liang, Hong Chang ^a   Kim, Eun il ^a   Shearer, Jason ^a   Helton, Matthew E ^a   Kim, Eunsuk ^a   Kaderli, Susan ^b   Incarvito, Christopher D ^c   Zuberbühler, Andreas D ^b   Rheingold, Arnold L ^c   Karlin, Kenneth D ^a  

^a JOHNS HOPKINS UNIVERSITY   (United States)

^b UNIVERSITY OF DELAWARE   (United States)

^c UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPLEX; COPPER DERIVATIVE; LIGAND; OXYGEN;

ARTICLE; CRYSTAL STRUCTURE; ELECTRONICS; ENTHALPY; OXIDATION; REACTION ANALYSIS; REACTION OPTIMIZATION; X RAY CRYSTALLOGRAPHY;

COPPER; CRYSTALLOGRAPHY, X-RAY; KINETICS; MOLECULAR STRUCTURE; ORGANOMETALLIC COMPOUNDS; OXIDATION-REDUCTION; OXYGEN;

EID: 0037460142     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja028779v     Document Type: Article

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34. 8), indicating that the reaction is proceeding via a rate-limiting oxidative C-H bond cleavage. Studies are in progress.