Thermal stability of Ti-catalyzed Si nanowires

Applied Physics Letters

Volumn 82, Issue 2, 2003, Pages 263-265

  Kamins, T I ^a   Li, X ^a   Williams, R Stanley ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CATALYSIS; CHEMICAL VAPOR DEPOSITION; SILICON; THERMODYNAMIC STABILITY;

SILICON NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 0037434334     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1534616     Document Type: Article

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