Phosphorus and boron diffusion in silicon under equilibrium conditions

Applied Physics Letters

Volumn 82, Issue 14, 2003, Pages 2254-2256

  Christenserr, J S ^a   Radamson, H H ^a   Kuznetsov, A Yu ^a,b   Svensson, B G ^a,b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b UNIVERSITY OF OSLO   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BORON; CHEMICAL BONDS; EPITAXIAL GROWTH; PHOSPHORUS; SEMICONDUCTING FILMS; SILICON;

BORON DIFFUSION;

DIFFUSION;

EID: 0037425080     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1566464     Document Type: Article

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