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Volumn 39, Issue 3, 2003, Pages 321-323

Demonstration of a high performance 4H-SiC vertical junction field effect transistor without epitaxial regrowth

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; FABRICATION; GATES (TRANSISTOR); MOSFET DEVICES; SEMICONDUCTOR DOPING;

EID: 0037421806     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20030178     Document Type: Article
Times cited : (1)

References (10)
  • 8
    • 0343442323 scopus 로고    scopus 로고
    • Theoretical and experimental study of 4H-SiC junction edge termination
    • LI, X., TONE, K., CAO, L.H., ALEXANDROV, P., FURSIN, L., and ZHAO, J.H.: 'Theoretical and experimental study of 4H-SiC junction edge termination', Mater Sci. Forum, 2000, 338-342, p. 1375
    • (2000) Mater Sci. Forum , vol.338-342 , pp. 1375
    • Li, X.1    Tone, K.2    Cao, L.H.3    Alexandrov, P.4    Fursin, L.5    Zhao, J.H.6
  • 9
    • 0000235739 scopus 로고    scopus 로고
    • Temperature dependence of avalanche breakdown for epitaxial diodes in 4H-SiC
    • KONSTANTINOV, A., NORDELL, N., WAHAB, Q., and LINDEFELT, U.: 'Temperature dependence of avalanche breakdown for epitaxial diodes in 4H-SiC', Appl. Phys. Lett., 1998, 73, (13), pp. 1850-1852
    • (1998) Appl. Phys. Lett. , vol.73 , Issue.13 , pp. 1850-1852
    • Konstantinov, A.1    Nordell, N.2    Wahab, Q.3    Lindefelt, U.4
  • 10
    • 0033079457 scopus 로고    scopus 로고
    • Temperature dependence of hole impact ionization coefficients in 4H and 6H-SiC
    • RAGHUNATHAN, R., and BALIGA, B.J.: 'Temperature dependence of hole impact ionization coefficients in 4H and 6H-SiC', Solid-State Electron., 1999, 43, pp. 199-211
    • (1999) Solid-State Electron. , vol.43 , pp. 199-211
    • Raghunathan, R.1    Baliga, B.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.