Ab initio molecular orbital characterization of sources for photo-assisted radical beam epitaxy of group-III nitrides

Computational Materials Science

Volumn 27, Issue 1-2, 2003, Pages 50-57

  Hayashi, Keiji ^a   Kanayama, Takuo ^a   Kojima, Hideki ^a   Shimizu, Toyohiro ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ab initio molecular orbital methods; Group III nitride; Photo assisted radical beam epitaxy

Indexed keywords

ELECTRONS; FREE RADICALS; GALLIUM NITRIDE; NITROGEN; PHOTODISSOCIATION; STOICHIOMETRY;

MOLECULAR ORBITAL METHODS;

MOLECULAR BEAM EPITAXY;

EID: 0037370075     PISSN: 09270256     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0256(02)00424-X     Document Type: Conference Paper

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