Fabrication of sub-10-nm Au-Pd structures using 30 keV electron beam lithography and lift-off

Microelectronic Engineering

Volumn 65, Issue 3, 2003, Pages 327-333

  Lehmann, F ^a   Richter, G ^a   Borzenko, T ^a   Hock, V ^a   Schmidt, G ^a   Molenkamp, L W ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

E beam lithography; Nanolithography; Two layer resist system

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FABRICATION; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PALLADIUM; POLYMETHYL METHACRYLATES;

LINE ARRAYS;

GOLD;

EID: 0037363239     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00963-2     Document Type: Article

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