Three-dimensional microdrilling of glass by multiphoton process and chemical etching

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 10 A, 1999, Pages

  Kondo, Yuki ^a   Qiu, Jianrong ^a   Mitsuyu, Tsuneo ^a   Hirao, Kazuyuki ^a   Yoko, Toshinobu ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DRILLING; ETCHING; HEAT TREATMENT; LASER PULSES; LITHIUM COMPOUNDS; MULTIPHOTON PROCESSES; SILICA;

FEMTOSECOND LASER; MICRODRILLING;

PHOTOSENSITIVE GLASS;

EID: 0033353259     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l1146     Document Type: Article

References (11)