Enhanced chemical vapor deposition of tantalum oxide thin films from in-situ reduction of PtOx electrode

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 2, 2003, Pages 502-505

  Liu, Tzu Ping ^a   Huang, Wei Pang ^a   Wu, Tai Bor ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; ELECTRODES; PLATINUM COMPOUNDS; REDUCTION; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES; TANTALUM COMPOUNDS;

ROOM TEMPERATURE;

THIN FILMS;

EID: 0037351636     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1554991     Document Type: Article

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