A replaceable, low thermal mass hot stage for scanning probe microscopy

Review of Scientific Instruments

Volumn 74, Issue 3 I, 2003, Pages 1390-1392

  Trawick, Matthew L ^a   Angelescu, Dan E ^a   Chaikin, Paul M ^a   Valenti, Michael J ^b   Register, Richard A ^b  

^a PRINCETON UNIVERSITY   (United States)

^b Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRODES; MICROPROCESSOR CHIPS; SILICON NITRIDE;

SCANNING PROBE MICROSCOPY (SPM);

THERMOMETERS;

EID: 0037350740     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1539892     Document Type: Article

References (15)

1. S. G. Prilliman, A. M. Kavanagh, E. C. Scher, S. T. Robertson, K. S. Hwang, and V. L. Colvin, Rev. Sci. Instrum. 69, 3245 (1998).
2. F. Oulevey, G. Gremaud, A. J. Kulik, and B. Guisolan, Rev. Sci. Instrum. 70, 1889 (1999).
3. M. DiBattista, S. V. Patel, J. F. Mansfield, and J. W. Schwank, Appl. Surf. Sci. 141, 119 (1999).
4. R. K. Workman and S. Manne, Rev. Sci. Instrum. 71, 431 (2000).
5. Z. Xie, E. Z. Luo, J. B. Xu, I. H. Wilson, L. H. Zhao, and X. X. Zhang, Rev. Sci. Instrum. 71, 2100 (2000).
6. Tystar Tytan low pressure chemical vapor deposition furnace.
7. -6 Torr base pressure.
8. 2 1 g, KI 4 g, DI water 160 g.
9. 2 at 280 °C.
10. Arch Chemical Durimide 285, spin coated at 4000 rpm, annealed 30 min at 250 °C, 30 min at 300 °C, 20 min at 250 °C.
11. Same as Ref. 9 but at 220 °C.
12. Dupont Teflon AF 2400 0.1% in 3M Fluorinert FC-75 solvent, spin coated at 5000 rpm, annealed 15 min at 250 °C.
13. Spin coated Shin-Etsu MicroSi HMDS adhesion promoter and Clariant AZ 5214 photoresist at 4000 rpm, baked 1 min at 95 °C, peeled with EZ Start Frustration-Free Mailing Tape, Henkel Consumer Adhesives, Inc., Avon, OH.
14. 2 for polyimide.
15. For stop-motion microscopy with coarser time resolution (using a slower, commercial hot stage), see C. Harrison, D. H. Adamson, Z. D. Cheng, J. M. Sebastian, S. Sethuraman, D. A. Huse, R. A. Register, and P. M. Chaikin, Science 290, 1558 (2000).