Detection and identification of organic contamination on silicon substrates

Solid State Phenomena

Volumn 76-77, Issue , 2001, Pages 111-114

  Roche, A ^a   Marthon, S ^a   Pie, J F ^a   Rochat, N ^a   Danel, A ^b   Olivier, M ^a   Juhel, M ^c   Tardif, F ^a  

^a CEA LETI   (France)

^b EURIS   (France)

^c STMICROELECTRONICS   (France)

Author keywords

Characterisation; Organic

Indexed keywords

CONTAMINATION; SECONDARY ION MASS SPECTROMETRY;

CHARACTERISATION; DETECTION AND IDENTIFICATIONS; OPTICAL THICKNESS; ORGANIC; ORGANIC CONTAMINATION; SILICON SUBSTRATES; SURFACE HYDROPHOBICITY; TD-GC-MS;

SILICON WAFERS;

EID: 83055184045     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.76-77.111     Document Type: Conference Paper

References (15)

1. F. A. Stevie, et al., J. Vac. Sci. Technol. A9 (1994), p. 2813.
2. Special Report, Cleanrooms (1999), p. 21.
3. P. Smith, P. Lindley, Characterization and metrology for ULSI Technology: 1998 International Conference, Seiler et al. eds. (1998), p. 133.
4. International Technology Roadmap for Semiconductors, 1999 Edition, Semiconductor Industry Association.
5. P. Roman, et al., Electrochemical Society Meeting 1999, Honolulu.
6. A. Danel, et al., Solid State Technology, Sept. 1999.
7. R. Newcomb, et al., Proc. of Electrochem. Soc., Symposium “Diagnostic Techniques for Semiconductor Material and Devices”, Honolulu, HI, Oct. 1999.
8. A. Danel, et al., to be published in the Proc. of UCPSS’2000, Oostend, Belgium.
9. N. Rochat, et al., to be published in Appl. Phys. Lett.
10. M. Beyer, et al, App. Surface Science 63, (1993), p. 88.
11. K. J. Budde, et al., J. Electrochemical Soc. 142 (3), (1995), p. 888.
12. K. Saga and T. Hattori, J. Electrochemical Soc. 143 (10) (1996), p. 3279.
13. F. Sugimoto and S. Okamura, J. Electrochemical Soc. 146 (7) (1999), p. 2725.
14. K. Budde and W. Holapfel, Organic contamination workshop, Scmicon Europa 2000 proceedings, Munich, April 2000.
15. K. Hoshino, Organic contamination workshop, Semicon Europa 2000 proceedings, Munich, April 2000.