Auger peak shape analysis of AlN film grown by ammonia plasma

Surface and Interface Analysis

Volumn 35, Issue 2, 2003, Pages 141-145

  Wang, P W ^a   Sui, Shixian ^b   Durrer, W G ^c   Craig Jr , J H ^a  

^a BRADLEY UNIVERSITY   (United States)

^b CYPRESS SEMICONDUCTOR   (United States)

^c UNIVERSITY OF TEXAS AT EL PASO   (United States)

Author keywords

AES; AlN; Ammonia; Depth profile; Plasma

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; SPUTTERING; VACUUM APPLICATIONS;

AUGER PEAK SHAPE ANALYSIS;

FILM GROWTH;

EID: 0037328521     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1509     Document Type: Article

References (21)

1. Farrell RF. In McGraw-Hill Encyclopedia of Science and Technology (7th edn), vol. 11. McGraw-Hill: New York, 1992; 32.
2. Cline CF, Kahn JS. J. Electrochem. Soc. 1963; 110: 773.
3. Slack GA, McNelly TF. J. Cryst. Growth 1976; 34: 263.
4. Wernick S, Pinner R, Sheasby P. The Surface Treatment and Finishing of Aluminium and its Alloys, Gardner Publications. (5th edn). American Society of Metals International: Metal Park, Cincinnati, OH, 1987; 180.
5. Goldberg Y. In Properties of Advanced Semiconductor Materials: GaN, AiN, InN, BN, SiC, SiGe, Levinshtein ME, Rumyantsev SL, Shur MS (eds). John Wiley: Chichester, 2001; Chapter 2.
6. Strite S, Morkoc H. J. Vac. Sci. Technol. B 1992; 10: 1237.
7. Morgan JS, Bryden WA, Kistenmacher TJ, Ecelberger SA, Poehler TO. J. Mater. Res. 1996; 5: 2677.
8. Hoffman DM, Rangara SP, Athavale SD, Economou DJ, Liu JR, Zheng Z, Chu WK. J. Vac. Sci. Technol. A 1996; 14: 306.
9. Russell JN, Jr., Bermudez VM, Leming A. J. Vac. Sci. Technol. A 1996; 14: 908.
10. Heffelfinger JR, Medlin DL, McCarty KF. J. Appl. Phys. 1999; 85: 466.
11. Meletis EI, Yan S. J. Vac. Sci. Technol. A 1991; 9: 2279.
12. Narayan J, Wu H, Vispute RD. J. Electron. Mater. 1996; 25: 143.
13. Lu YF, Ren ZM, Chong TC, Cheong BA, Chow SK, Wang JP. J. Appl. Phys. 2000; 87: 1540.
14. Wang PW, Sui SX, Wang WS, Durrer WG. Thin Solid Films 1997; 295: 142.
15. Davis LE, MacDonald NC, Palmberg PW, Riach GE, Weber RE. Handbook of Auger Spectroscopy, (2nd edn) Perkin-Elmer: Eden Prairie, MN, 1976; 43,47.
16. Madden HH, Goodman DW. Surf. Sci. 1985; 150: 39.
17. Michel R, Jourdan C, Castaldi J, Derrien J. Surf. Sci. 1979; 84: L509.
18. Fontain JM, Lee-Deacon O, Duraud JP, Ichimura S, Le Gressus C. Surf. Sci. 1982; 122: 7.
19. Wang Paul W, Sui Shixian, Durrer William G. Appl. Surf. Sci. 2001; 178: 98.
20. Gautier M, Duraud JP, Massignon C. Surf. Sci. 1981; 111: L705.
21. Shinar R. J. Vac. Sci. Technol. A 1992; 10: 137.