Single-Phase Aluminum Nitride Films by Dc-Magnetron Sputtering

Journal of Materials Research

Volumn 5, Issue 11, 1990, Pages 2677-2681

  Morgan, J S ^a   Bryden, W A ^a   Kistenmacher, T J ^a   Ecelberger, S A ^a   Poehler, T O ^a  

^a JOHNS HOPKINS UNIVERSITY APPLIED PHYSICS LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS - THIN FILMS; FILMS - OPTICAL PROPERTIES; QUARTZ - SUBSTRATES; SAPPHIRE - SUBSTRATES; SPUTTERING - APPLICATIONS;

ALUMINUM NITRIDE; DC MAGNETRON SPUTTERING;

NITRIDES;

EID: 0025518967     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1990.2677     Document Type: Article

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