Effects of film type and nanotopography of wafers on oxide CMP characteristics

Journal of the Korean Physical Society

Volumn 40, Issue 1, 2002, Pages 180-183

  Katoh, T ^a   Ko, B G ^a   Park, J H ^a   Yoo, H C ^a   Park, J G ^a   Paik, U G ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036002428     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (15)

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