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Volumn 21, Issue 1, 2003, Pages 140-148

Photosensitivity and application with 157-nm F2 laser radiation in planar lightwave circuits

Author keywords

Birefringence; F2 excimer laser; Photosensitivity; Planar lightwave circuit; UV trimming

Indexed keywords

ATOMIC FORCE MICROSCOPY; BIREFRINGENCE; DIFFRACTION GRATINGS; EXCIMER LASERS; FREQUENCY DOMAIN ANALYSIS; GAS LASERS; INTERFACES (MATERIALS); LIGHT MODULATORS; PHOTOSENSITIVITY; REFRACTIVE INDEX;

EID: 0037258976     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2002.802227     Document Type: Article
Times cited : (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.