Photosensitivity in silica-based waveguides deposited by atmospheric pressure chemical vapor deposition

Applied Optics

Volumn 37, Issue 12, 1998, Pages 2242-2244

  Saito, Takashi ^a   Hanada, Tadahiko ^a   Kitamura, Naoki ^a   Kitamura, Mitsuhiro ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; OPTICAL PROPERTY; REFRACTIVE INDEX; SILICA;

EID: 0032550376     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.002242     Document Type: Article

References (15)

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