Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

Applied Optics

Volumn 39, Issue 24, 2000, Pages 4296-4299

  Canning, John ^a   Åslund, Mattias ^a   Ankiewicz, Adrian ^b   Dainese, Matteo ^c   Fernando, Harendra ^c   Sahu, Jayanta K ^c   Anki Wosinskiewicz, Lech ^c  

^a UNIVERSITY OF SYDNEY   (Australia)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^c ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COMPRESSIVE STRESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ULTRAVIOLET RADIATION;

STRESS ANISOTROPY;

BIREFRINGENCE;

EID: 0001687764     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.004296     Document Type: Article

References (8)

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